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Custom Photomasks Available from KyNN

Photolithography is one of the most critical and frequently used steps in fabricating micro and nano devices. University research involving the fabrication of micro and nano devices typically requires between 1 and 12 lithographic steps, while advanced commercial CMOS processes often require upwards of 20 or 30 masks. Because of the performance and cost improvements to microfabricated devices, there is a strong need for sub-micron capabilities for the next generation of devices. The goal of this component of the KyNN is to establish a true “KORE” (Kentucky Optical REsources) facility for providing custom high-resolution photomasks to all researchers and educators within the Commonwealth and beyond.

With the recent addition of the new Heidleberg 66FS to the Shumaker Research Building, UofL has seen a remarkable increase in its mask making capabilities.  Because of this, UofL is expanding its mask writing capability to other members of KYNanoNET.  To find out more about the capabilities of the Heidleberg 66FS and learn how to submit a request to have a mask made, check out the Louisville Photomask website.


Various types of mask writing are avaiable:

 - four, five, six, and seven inch photomasks

 - Testing and Prime grade photomasks

 - Iron Oxide or Low Reflectivity Chrome photomasks

 - Feature size as small as 600nm

 - Direct write on wafers

 - 32 and 128 Grayscale Lithography

Entries in LPG (1)



This graph showcases the use of KORE in the past year.  While internal photomask generation is still generating most of the LPG use, outside requests are becoming more and more popular.